H.C. Starck Develops Planar and Rotary Sputtering Targets

The Fabricated Products Group of H.C. Starck Inc. has produced sputter targets in nickel-based (Ni) and molybdenum alloys providing superior sputtering performance meant for energy applications of thin films PV (TFPV).

H.C. Starck is a producer of tantalum (Ta), tungsten (W) and molybdenum (Mo) powders and has rich experience in pressing, reducing and sintering these materials into end products. The company utilizes advanced technologies, specialized equipment and sophisticated Thin Film Materials Lab to produce rotary sputtering targets for applications in solar cells, coatings over large areas and LCD displays.

The company developed these rotary and planar sputtering targets in an effort to reduce the electrical energy costs in the photovoltaic industry.

H.C. Starck has the capability of producing molybdenum rotary targets having inner diameters of 135 mm (bonded) and 125 mm (monolithic). The company also produces niobium, tantalum and nickel-vanadium among other materials in rotary or planar form.